Extreme Ultraviolet Photoresponse of Organotin-Based Photoresists with Borate Counteranions.

Inorganic−organic hybrid photoresist extreme ultraviolet lithography metal-based photoresist tin-based photoresist tin-oxo-hydroxo cage

Journal

ACS applied materials & interfaces
ISSN: 1944-8252
Titre abrégé: ACS Appl Mater Interfaces
Pays: United States
ID NLM: 101504991

Informations de publication

Date de publication:
05 Aug 2024
Historique:
medline: 6 8 2024
pubmed: 6 8 2024
entrez: 5 8 2024
Statut: aheadofprint

Résumé

Organometallic tin-oxo-hydroxo cage compounds offer a promising photoresist platform for extreme ultraviolet photolithography (EUVL). Their reactivity is dominated by the facile breaking of the tin-carbon bonds upon photon or electron irradiation. As the cage is dicationic, it exists as a complex with anions for charge compensation. In the present work, we explore the

Identifiants

DOI: 10.1021/acsami.4c08636 PMID: 39103240
pubmed: 39103240
doi: 10.1021/acsami.4c08636
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Auteurs

Quentin Evrard (Q)

Advanced Research Center for Nanolithography ARCNL, Science Park 106, 1098 XG Amsterdam, The Netherlands.
van't Hoff Institute for Molecular Sciences, University of Amsterdam, P.O. Box 94157, 1090 GD Amsterdam, The Netherlands.
ORCID: 0000-0001-8724-8946

Najmeh Sadegh (N)

Advanced Research Center for Nanolithography ARCNL, Science Park 106, 1098 XG Amsterdam, The Netherlands.

Simon Mathew (S)

van't Hoff Institute for Molecular Sciences, University of Amsterdam, P.O. Box 94157, 1090 GD Amsterdam, The Netherlands.
ORCID: 0000-0003-2480-3222

Ed Zuidinga (E)

van't Hoff Institute for Molecular Sciences, University of Amsterdam, P.O. Box 94157, 1090 GD Amsterdam, The Netherlands.

Benjamin Watts (B)

Paul Scherrer Institute, Forschungsstrasse 111, 5232 Villigen PSI, Switzerland.

Maximilian Paradiz Dominguez (M)

van't Hoff Institute for Molecular Sciences, University of Amsterdam, P.O. Box 94157, 1090 GD Amsterdam, The Netherlands.

Angelo Giglia (A)

CNR-IOM─Istituto Officina dei Materiali, National Research Council of Italy, Strada Statale 14 km 163, 5, Basovizza, Trieste 34149, Italy.
ORCID: 0000-0002-1672-9029

Nicola Mahne (N)

CNR-IOM─Istituto Officina dei Materiali, National Research Council of Italy, Strada Statale 14 km 163, 5, Basovizza, Trieste 34149, Italy.

Stefano Nannarone (S)

CNR-IOM─Istituto Officina dei Materiali, National Research Council of Italy, Strada Statale 14 km 163, 5, Basovizza, Trieste 34149, Italy.

Akira Nishimura (A)

Nippon Shokubai, 5-8 Nishi Otabi-cho, Suita, Osaka 564-0034, Japan.

Tsuyoshi Goya (T)

Nippon Shokubai, 5-8 Nishi Otabi-cho, Suita, Osaka 564-0034, Japan.

Takuo Sugioka (T)

Nippon Shokubai, 5-8 Nishi Otabi-cho, Suita, Osaka 564-0034, Japan.

Michaela Vockenhuber (M)

Paul Scherrer Institute, Forschungsstrasse 111, 5232 Villigen PSI, Switzerland.

Yasin Ekinci (Y)

Paul Scherrer Institute, Forschungsstrasse 111, 5232 Villigen PSI, Switzerland.
ORCID: 0000-0002-0331-0501

Albert M Brouwer (AM)

Advanced Research Center for Nanolithography ARCNL, Science Park 106, 1098 XG Amsterdam, The Netherlands.
van't Hoff Institute for Molecular Sciences, University of Amsterdam, P.O. Box 94157, 1090 GD Amsterdam, The Netherlands.
ORCID: 0000-0002-1731-3869

Classifications MeSH