Domain-Dependent Surface Adhesion in Twisted Few-Layer Graphene: Platform for Moiré-Assisted Chemistry.

nanoengineering rhombohedral and Bernal stacking domains surface chemistry twisted graphene moiré

Journal

Nano letters
ISSN: 1530-6992
Titre abrégé: Nano Lett
Pays: United States
ID NLM: 101088070

Informations de publication

Date de publication:
26 Apr 2023
Historique:
medline: 11 4 2023
pubmed: 11 4 2023
entrez: 10 4 2023
Statut: ppublish

Résumé

Twisted van der Waals multilayers are widely regarded as a rich platform to access novel electronic phases thanks to the multiple degrees of freedom available for controlling their electronic and chemical properties. Here, we propose that the stacking domains that form naturally due to the relative twist between successive layers act as an additional "knob" for controlling the behavior of these systems and report the emergence and engineering of stacking domain-dependent surface chemistry in twisted few-layer graphene. Using mid-infrared near-field optical microscopy and atomic force microscopy, we observe a selective adhesion of metallic nanoparticles and liquid water at the domains with rhombohedral stacking configurations of minimally twisted double bi- and trilayer graphene. Furthermore, we demonstrate that the manipulation of nanoparticles located at certain stacking domains can locally reconfigure the moiré superlattice in their vicinity at the micrometer scale. Our findings establish a new approach to controlling moiré-assisted chemistry and nanoengineering.

Identifiants

pubmed: 37036942
doi: 10.1021/acs.nanolett.2c04137
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

3137-3143

Auteurs

Valerie Hsieh (V)

Department of Physics, Columbia University, New York, New York 10027, United States.

Dorri Halbertal (D)

Department of Physics, Columbia University, New York, New York 10027, United States.

Nathan R Finney (NR)

Department of Physics, Columbia University, New York, New York 10027, United States.

Ziyan Zhu (Z)

Department of Physics, Harvard University, Cambridge, Massachusetts 02138, United States.
Stanford Institute for Materials and Energy Sciences, SLAC National Accelerator Laboratory, Menlo Park, California 94025, United States.

Eli Gerber (E)

School of Applied and Engineering Physics, Cornell University, Ithaca, New York 14853, United States.

Michele Pizzochero (M)

John A. Paulson School of Engineering and Applied Sciences, Harvard University, Cambridge, Massachusetts 02138, United States.

Emine Kucukbenli (E)

John A. Paulson School of Engineering and Applied Sciences, Harvard University, Cambridge, Massachusetts 02138, United States.
Information Systems Department, Boston University, Boston, Massachusetts 02215, United States.

Gabriel R Schleder (GR)

John A. Paulson School of Engineering and Applied Sciences, Harvard University, Cambridge, Massachusetts 02138, United States.
Brazilian Nanotechnology National Laboratory, CNPEM, Campinas 13083-970, São Paulo, Brazil.

Mattia Angeli (M)

John A. Paulson School of Engineering and Applied Sciences, Harvard University, Cambridge, Massachusetts 02138, United States.

Kenji Watanabe (K)

Research Center for Functional Materials, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan.

Takashi Taniguchi (T)

International Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan.

Eun-Ah Kim (EA)

Department of Physics, Cornell University, Ithaca, New York 14853, United States.

Efthimios Kaxiras (E)

Department of Physics, Harvard University, Cambridge, Massachusetts 02138, United States.
John A. Paulson School of Engineering and Applied Sciences, Harvard University, Cambridge, Massachusetts 02138, United States.

James Hone (J)

Department of Physics, Columbia University, New York, New York 10027, United States.

Cory R Dean (CR)

Department of Physics, Columbia University, New York, New York 10027, United States.

D N Basov (DN)

Department of Physics, Columbia University, New York, New York 10027, United States.

Classifications MeSH