Wafer-scale integration of GaAs/AlGaAs core-shell nanowires on silicon by the single process of self-catalyzed molecular beam epitaxy.


Journal

Nanoscale advances
ISSN: 2516-0230
Titre abrégé: Nanoscale Adv
Pays: England
ID NLM: 101738708

Informations de publication

Date de publication:
14 Mar 2023
Historique:
received: 25 11 2022
accepted: 23 01 2023
entrez: 17 3 2023
pubmed: 18 3 2023
medline: 18 3 2023
Statut: epublish

Résumé

GaAs/AlGaAs core-shell nanowires, typically having 250 nm diameter and 6 μm length, were grown on 2-inch Si wafers by the single process of molecular beam epitaxy using constituent Ga-induced self-catalysed vapor-liquid-solid growth. The growth was carried out without specific pre-treatment such as film deposition, patterning, and etching. The outermost Al-rich AlGaAs shells form a native oxide surface protection layer, which provides efficient passivation with elongated carrier lifetime. The 2-inch Si substrate sample exhibits a dark-colored feature due to the light absorption of the nanowires where the reflectance in the visible wavelengths is less than 2%. Homogeneous and optically luminescent and adsorptive GaAs-related core-shell nanowires were prepared over the wafer, showing the prospect for large-volume III-V heterostructure devices available with this approach as complementary device technologies for integration with silicon.

Identifiants

pubmed: 36926567
doi: 10.1039/d2na00848c
pii: d2na00848c
pmc: PMC10012865
doi:

Types de publication

Journal Article

Langues

eng

Pagination

1651-1663

Informations de copyright

This journal is © The Royal Society of Chemistry.

Déclaration de conflit d'intérêts

The authors declare no competing interests or personal relationships that could have appeared to influence the work reported in this paper.

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Auteurs

Keisuke Minehisa (K)

Research Center for Integrated Quantum Electronics, Hokkaido University Sapporo 060-0813 Japan ishikawa.fumitaro@rciqe.hokudai.ac.jp.
Faculty of Information Science and Technology, Hokkaido University Sapporo 060-0814 Japan.

Ryo Murakami (R)

Graduate School of Science and Engineering, Ehime University Matsuyama 790-8577 Japan.

Hidetoshi Hashimoto (H)

Research Center for Integrated Quantum Electronics, Hokkaido University Sapporo 060-0813 Japan ishikawa.fumitaro@rciqe.hokudai.ac.jp.
Faculty of Information Science and Technology, Hokkaido University Sapporo 060-0814 Japan.

Kaito Nakama (K)

Research Center for Integrated Quantum Electronics, Hokkaido University Sapporo 060-0813 Japan ishikawa.fumitaro@rciqe.hokudai.ac.jp.
Faculty of Information Science and Technology, Hokkaido University Sapporo 060-0814 Japan.

Kenta Sakaguchi (K)

Graduate School of Science and Engineering, Ehime University Matsuyama 790-8577 Japan.

Rikuo Tsutsumi (R)

Graduate School of Science and Engineering, Ehime University Matsuyama 790-8577 Japan.

Takeru Tanigawa (T)

Graduate School of Science and Engineering, Ehime University Matsuyama 790-8577 Japan.

Mitsuki Yukimune (M)

Graduate School of Science and Engineering, Ehime University Matsuyama 790-8577 Japan.

Kazuki Nagashima (K)

Graduate School of Engineering, The University of Tokyo 113-8656 Japan.

Takeshi Yanagida (T)

Graduate School of Engineering, The University of Tokyo 113-8656 Japan.

Shino Sato (S)

Faculty of Information Science and Technology, Hokkaido University Sapporo 060-0814 Japan.

Satoshi Hiura (S)

Faculty of Information Science and Technology, Hokkaido University Sapporo 060-0814 Japan.

Akihiro Murayama (A)

Faculty of Information Science and Technology, Hokkaido University Sapporo 060-0814 Japan.

Fumitaro Ishikawa (F)

Research Center for Integrated Quantum Electronics, Hokkaido University Sapporo 060-0813 Japan ishikawa.fumitaro@rciqe.hokudai.ac.jp.

Classifications MeSH