High-Performance n-Type Ge-Free Silicon Thermoelectric Material from Silicon Waste.

Ge-free multiscale phonon scattering n-type silicon silicon waste thermoelectric material

Journal

ACS applied materials & interfaces
ISSN: 1944-8252
Titre abrégé: ACS Appl Mater Interfaces
Pays: United States
ID NLM: 101504991

Informations de publication

Date de publication:
13 Oct 2021
Historique:
pubmed: 30 9 2021
medline: 30 9 2021
entrez: 29 9 2021
Statut: ppublish

Résumé

Silicon waste (SW), a byproduct from the photovoltaic industry, can be a prospective and environmentally friendly source for silicon in the field of thermoelectric (TE) materials. While thermoelectricity is not as sensitive toward impurities as other semiconductor applications, the impurities within the SW still impede the enhancement of the thermoelectric figure of merit,

Identifiants

pubmed: 34586775
doi: 10.1021/acsami.1c12200
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

47912-47920

Auteurs

Zhenhui Liu (Z)

Leibniz Institute for Solid State and Materials Research Dresden (IFW Dresden), 01069 Dresden, Germany.
Institute of Materials Science, Dresden University of Technology (TU Dresden), 01062 Dresden, Germany.

Qihao Zhang (Q)

Leibniz Institute for Solid State and Materials Research Dresden (IFW Dresden), 01069 Dresden, Germany.

Ulrike Wolff (U)

Leibniz Institute for Solid State and Materials Research Dresden (IFW Dresden), 01069 Dresden, Germany.

Christian G F Blum (CGF)

Leibniz Institute for Solid State and Materials Research Dresden (IFW Dresden), 01069 Dresden, Germany.

Ran He (R)

Leibniz Institute for Solid State and Materials Research Dresden (IFW Dresden), 01069 Dresden, Germany.

Amin Bahrami (A)

Leibniz Institute for Solid State and Materials Research Dresden (IFW Dresden), 01069 Dresden, Germany.

Maximilian Beier-Ardizzon (M)

Fraunhofer Institute for Integrated Systems and Device Technology, 91058 Erlangen, Germany.

Christian Reimann (C)

Fraunhofer Institute for Integrated Systems and Device Technology, 91058 Erlangen, Germany.

Jochen Friedrich (J)

Fraunhofer Institute for Integrated Systems and Device Technology, 91058 Erlangen, Germany.

Heiko Reith (H)

Leibniz Institute for Solid State and Materials Research Dresden (IFW Dresden), 01069 Dresden, Germany.

Gabi Schierning (G)

Faculty of Physics, Bielefeld University, 33615 Bielefeld, Germany.

Kornelius Nielsch (K)

Leibniz Institute for Solid State and Materials Research Dresden (IFW Dresden), 01069 Dresden, Germany.
Institute of Materials Science, Dresden University of Technology (TU Dresden), 01062 Dresden, Germany.

Classifications MeSH