Optimal n-Type Al-Doped ZnO Overlayers for Charge Transport Enhancement in p-Type Cu
ALD
Al-doped ZnO
Cu2O
charge transport
photocathodes
photoelectrochemical
Journal
Micromachines
ISSN: 2072-666X
Titre abrégé: Micromachines (Basel)
Pays: Switzerland
ID NLM: 101640903
Informations de publication
Date de publication:
22 Mar 2021
22 Mar 2021
Historique:
received:
23
02
2021
revised:
15
03
2021
accepted:
17
03
2021
entrez:
3
4
2021
pubmed:
4
4
2021
medline:
4
4
2021
Statut:
epublish
Résumé
An effective strategy for improving the charge transport efficiency of p-type Cu
Identifiants
pubmed: 33810027
pii: mi12030338
doi: 10.3390/mi12030338
pmc: PMC8004703
pii:
doi:
Types de publication
Journal Article
Langues
eng
Subventions
Organisme : National Research Foundation of Korea
ID : 2019R1A6A1A03033215
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