Chlorine-based DUWL disinfectant leads to a different microbial composition of water derived biofilms compared to H

Biofilm Dental unit waterlines Disinfection Microbiome Sequencing Water quality

Journal

PeerJ
ISSN: 2167-8359
Titre abrégé: PeerJ
Pays: United States
ID NLM: 101603425

Informations de publication

Date de publication:
2020
Historique:
received: 27 03 2020
accepted: 17 06 2020
entrez: 4 8 2020
pubmed: 4 8 2020
medline: 4 8 2020
Statut: epublish

Résumé

Biofilm formation in dental unit waterlines (DUWL) may lead to health risks for dental staff and patients. Therefore, dental unit waterlines need to be disinfected, for instance by using chemical disinfectants. However, the application of chemical disinfectants may lead to the selection of specific microorganisms. Therefore, the aim of our study was to assess the microbial composition of water-derived biofilms, after a continuous exposure to maintenance doses of commercially available chemical disinfectants, in vitro. The AAA-model was used to grow water derived biofilms. The biofilms were subjected to the maintenance dose of each disinfectant. To determine the microbial composition, the V4 hypervariable region of the 16S rRNA gene was sequenced. The sequences were clustered in operational taxonomic units (OTUs). The bacterial composition of biofilms in all treatment groups differed significantly (PERMANOVA We concluded that exposure to low doses of the chlorine-based chemical disinfectant Anoxyl led to a substantially different composition of water derived biofilms compared to biofilms exposed to H

Sections du résumé

BACKGROUND BACKGROUND
Biofilm formation in dental unit waterlines (DUWL) may lead to health risks for dental staff and patients. Therefore, dental unit waterlines need to be disinfected, for instance by using chemical disinfectants. However, the application of chemical disinfectants may lead to the selection of specific microorganisms. Therefore, the aim of our study was to assess the microbial composition of water-derived biofilms, after a continuous exposure to maintenance doses of commercially available chemical disinfectants, in vitro.
METHODS METHODS
The AAA-model was used to grow water derived biofilms. The biofilms were subjected to the maintenance dose of each disinfectant. To determine the microbial composition, the V4 hypervariable region of the 16S rRNA gene was sequenced. The sequences were clustered in operational taxonomic units (OTUs).
RESULTS RESULTS
The bacterial composition of biofilms in all treatment groups differed significantly (PERMANOVA
CONCLUSION CONCLUSIONS
We concluded that exposure to low doses of the chlorine-based chemical disinfectant Anoxyl led to a substantially different composition of water derived biofilms compared to biofilms exposed to H

Identifiants

pubmed: 32742792
doi: 10.7717/peerj.9503
pii: 9503
pmc: PMC7368430
doi:

Types de publication

Journal Article

Langues

eng

Pagination

e9503

Informations de copyright

©2020 Zemouri et al.

Déclaration de conflit d'intérêts

The authors declare there are no competing interests.

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Auteurs

Charifa Zemouri (C)

Department of Preventive Dentistry, Academic Centre for Dentistry Amsterdam, Amsterdam, The Netherlands.

Alexa M G A Laheij (AMGA)

Department of Preventive Dentistry, Academic Centre for Dentistry Amsterdam, Amsterdam, The Netherlands.

Catherine M C Volgenant (CMC)

Department of Preventive Dentistry, Academic Centre for Dentistry Amsterdam, Amsterdam, The Netherlands.

Bernd W Brandt (BW)

Department of Preventive Dentistry, Academic Centre for Dentistry Amsterdam, Amsterdam, The Netherlands.

Wim Crielaard (W)

Department of Preventive Dentistry, Academic Centre for Dentistry Amsterdam, Amsterdam, The Netherlands.

Mark J Buijs (MJ)

Department of Preventive Dentistry, Academic Centre for Dentistry Amsterdam, Amsterdam, The Netherlands.

Egija Zaura (E)

Department of Preventive Dentistry, Academic Centre for Dentistry Amsterdam, Amsterdam, The Netherlands.

Johannes J de Soet (JJ)

Department of Preventive Dentistry, Academic Centre for Dentistry Amsterdam, Amsterdam, The Netherlands.

Classifications MeSH