Enhanced Reduction of Thermal Conductivity in Amorphous Silicon Nitride-Containing Phononic Crystals Fabricated Using Directed Self-Assembly of Block Copolymers.

block copolymer lithography directed self-assembly phononic crystal silicon nitride thermal conductivity

Journal

ACS nano
ISSN: 1936-086X
Titre abrégé: ACS Nano
Pays: United States
ID NLM: 101313589

Informations de publication

Date de publication:
23 Jun 2020
Historique:
pubmed: 28 5 2020
medline: 28 5 2020
entrez: 28 5 2020
Statut: ppublish

Résumé

Studies have demonstrated that the thermal conductivity (κ) of crystalline semiconductor materials can be reduced by phonon scattering in periodic nanostructures formed using templates fabricated from self-assembled block copolymers (BCPs). Compared to crystalline materials, the heat transport mechanisms in amorphous inorganic materials differ significantly and have been explored far less extensively. However, thermal management of amorphous inorganic solids is crucial for a broad range of semiconductor devices. Here we present the fabrication of freestanding amorphous silicon nitride (SiN

Identifiants

pubmed: 32459464
doi: 10.1021/acsnano.0c01463
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

6980-6989

Auteurs

Chun Zhou (C)

Pritzker School of Molecular Engineering, The University of Chicago, Chicago, Illinois 60637, United States.

Naoki Tambo (N)

Technology Innovation Division, Panasonic Corporation, Kyoto 619-0237, Japan.

Elizabeth Michiko Ashley (EM)

Pritzker School of Molecular Engineering, The University of Chicago, Chicago, Illinois 60637, United States.

Yuxuan Liao (Y)

Department of Mechanical Engineering, The University of Tokyo, Tokyo 113-8656, Japan.

Junichiro Shiomi (J)

Department of Mechanical Engineering, The University of Tokyo, Tokyo 113-8656, Japan.

Kouhei Takahashi (K)

Technology Innovation Division, Panasonic Corporation, Kyoto 619-0237, Japan.

Gordon S W Craig (GSW)

Pritzker School of Molecular Engineering, The University of Chicago, Chicago, Illinois 60637, United States.

Paul F Nealey (PF)

Pritzker School of Molecular Engineering, The University of Chicago, Chicago, Illinois 60637, United States.

Classifications MeSH