Dynamics of Antimonene-Graphene Van Der Waals Growth.

antimonene epitaxy graphene in situ microscopy van der Waals heterostructures

Journal

Advanced materials (Deerfield Beach, Fla.)
ISSN: 1521-4095
Titre abrégé: Adv Mater
Pays: Germany
ID NLM: 9885358

Informations de publication

Date de publication:
May 2019
Historique:
received: 24 01 2019
revised: 05 03 2019
pubmed: 11 4 2019
medline: 11 4 2019
entrez: 11 4 2019
Statut: ppublish

Résumé

Van der Waals (vdW) heterostructures have recently been introduced as versatile building blocks for a variety of novel nanoscale and quantum technologies. Harnessing the unique properties of these heterostructures requires a deep understanding of the involved interfacial interactions and a meticulous control of the growth of 2D materials on weakly interacting surfaces. Although several epitaxial vdW heterostructures have been achieved experimentally, the mechanisms governing their synthesis are still nebulous. With this perspective, herein, the growth dynamics of antimonene on graphene are investigated in real time. In situ low-energy electron microscopy reveals that nucleation predominantly occurs on 3D nuclei followed by a self-limiting lateral growth with morphology sensitive to the deposition rate. Large 2D layers are observed at high deposition rates, whereas lower growth rates trigger an increased multilayer nucleation at the edges as they become aligned with the Z2 orientation leading to atoll-like islands with thicker, well-defined bands. This complexity of the vdW growth is elucidated based on the interplay between the growth rate, surface diffusion, and edges orientation. This understanding lays the groundwork for a better control of the growth of vdW heterostructures, which is critical to their large-scale integration.

Identifiants

pubmed: 30968486
doi: 10.1002/adma.201900569
doi:

Types de publication

Journal Article

Langues

eng

Pagination

e1900569

Subventions

Organisme : U.S. Department of Energy, Office of Science, Basic Energy Sciences
ID : # DE-SC0016007

Informations de copyright

© 2019 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Auteurs

Matthieu Fortin-Deschênes (M)

Department of Engineering Physics, École Polytechnique de Montréal, C. P. 6079, Succursale Centre-Ville, Montréal, Québec, H3C 3A7, Canada.

Robert M Jacobberger (RM)

Department of Materials Science and Engineering, University of Wisconsin-Madison, Madison, WI, 53706, USA.

Charles-Antoine Deslauriers (CA)

Department of Engineering Physics, École Polytechnique de Montréal, C. P. 6079, Succursale Centre-Ville, Montréal, Québec, H3C 3A7, Canada.

Olga Waller (O)

Department of Engineering Physics, École Polytechnique de Montréal, C. P. 6079, Succursale Centre-Ville, Montréal, Québec, H3C 3A7, Canada.

Étienne Bouthillier (É)

Department of Engineering Physics, École Polytechnique de Montréal, C. P. 6079, Succursale Centre-Ville, Montréal, Québec, H3C 3A7, Canada.

Michael S Arnold (MS)

Department of Materials Science and Engineering, University of Wisconsin-Madison, Madison, WI, 53706, USA.

Oussama Moutanabbir (O)

Department of Engineering Physics, École Polytechnique de Montréal, C. P. 6079, Succursale Centre-Ville, Montréal, Québec, H3C 3A7, Canada.

Classifications MeSH